Author:
Shestakov V. A.,Kosyakov V. I.,Kosinova M. L.
Subject
Inorganic Chemistry,Physical and Theoretical Chemistry,Materials Science (miscellaneous)
Reference26 articles.
1. F. A. Kuznetsov, M. G. Voronkov, V. O. Borisov, et al., Fundamentals of Chemical Deposition of Films and Structures for Nanoelectronics. Ser. Integration Projects of Siberian Branch of the Russian Academy of Sciences (Izd–vo SO RAN, Novosibirsk, 2013), Iss. 37 [in Russian].
2. A. Sobczyk-Guzenda, K. Olesko, M. Gazicki-Lipman, et al., Mater. Res. Express 6, 016410 (2019).
https://doi.org/10.1088/2053-1591/aae4f9
3. Z. Khatami, P. J. Simpson, and P. Mascher, Nanotechnology 30, 314003 (2019).
https://doi.org/10.1088/1361-6528/ab180c
4. M. Murano, T. Matsutani, and T. Kawasaki, Vacuum 158, 60 (2018).
https://doi.org/10.1016/j.vacuum.2018.09.005
5. N. I. Fainer, A. G. Plekhanov, and I. P. Asanov, Glass Phys. Chem. 43, 410 (2017).
https://doi.org/10.1134/S1087659617050042
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