Films based on the phases in the Si-C-N System: Part 1. Synthesis and characterization of bis(trimethylsilyl)ethylamine as a precursor-Reference-Cited by-同舟云学术

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Films based on the phases in the Si-C-N System: Part 1. Synthesis and characterization of bis(trimethylsilyl)ethylamine as a precursor

Published:2012-02 Issue:1 Volume:38 Page:8-14
ISSN:1087-6596
Container-title:Glass Physics and Chemistry
language:en
Short-container-title:Glass Phys Chem

Author:

Sysoev S. V.,Kolontaeva A. O.,Nikulina L. D.,Kosinova M. L.,Kuznetsov F. A.,Rakhlin V. I.,Lis A. V.,Voronkov M. G.

Publisher

Pleiades Publishing Ltd

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites

Link

http://link.springer.com/content/pdf/10.1134/S1087659612010129.pdf

Reference43 articles.

1. Nakayamada, T., Matsuo, K., Hayashi, Y., Izumi, A., and Kadotani, Y., Evaluation of Corrosion Resistance of SiCN Films Deposited by HWCVD Using Organic Liquid Materials, Thin Solid Films, 2008, vol. 516, no. 5, pp. 656–658.

2. Fainer, N.I., Kosinova, M.L., Rumyantsev, Yu.M., Maximovskii, E.A., and Kuznetsov, F.A., Thin Silicon Carbonitride Films Are Perspective Low-k Materials, J. Phys. Chem. Solids, 2008, vol. 69, nos. 2–3, pp. 661–668.

3. Bielinski, D., Wrobel, A.M., and Walkiewicz-Pietrzykowska, A., Mechanical and Tribological Properties of Thin Remote Microwave Plasma CVD a-Si: N: C Films from a Single-Source Precursor, Tribol. Lett., 2002, vol. 13, no. 2, pp. 71–76.

4. Probst, D., Hoche, H., Zhou, Y., Hauser, R., Stelzner, T., Scheerer, H., Broszeit, E., Berger, C., Riedel, R., Stafast, H., and Koke, E., Development of PE-CVD Si/C/N: H Films for Tribological and Corrosive Complex-Load Conditions, Surf. Coat. Technol., 2005, vol. 200, nos. 1–4, pp. 355–359.

5. Fainer, N.I., Kosinova, M.L., Rumyantsev, Yu.M., Maksimovskii, E.A, Kuznetsov, F.A., Kesler, V.G., Kirienko, V.V., Han Bao-Shan, and Lu Cheng, Synthesis and Physicochemical Properties of Nanocrystalline Silicon Carbonitride Films Deposited by Microwave Plasma from Organoelement Compounds, Glass Phys. Chem., 2005, vol. 31, no. 4, pp. 427–432.

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thermodynamic modeling of the deposition of Si—C—N films from the gas phase during the decomposition of organosilicon compounds;Russian Chemical Bulletin;2018-06

2. Films based on phases in a Si–C–N system. Part II. plasma chemical synthesis of SiC x N y :Н films from the mixture of bis(trimethylsilyl)ethylamine and hydrogen;Glass Physics and Chemistry;2017-01

3. Synthesis and characterization of organosilicon compounds as novel precursors for CVD processes;Thermochimica Acta;2015-12

4. Et3GeN(SiMe3)2 and Et3SnN(SiMe3)2: New precursors for chemical vapor deposition processes;Inorganic Materials;2013-03-13

5. Bis(trimethylsilyl)Ethylamine: Synthesis, Properties and its use as CVD Precursor;Physics Procedia;2013

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