1. Hoffmann, P., Fainer, N., Kosinova, M., et al., Compilation on Synthesis, Characterization and Properties of Silicon and Boron Carbonitride Films, Silicon Carbide-Materials, Processing and Applications in Electronic Devices,Mukherjee, M., Ed., InTech, pp. 487–546.
2. Smirnova, T.P., Shainyan, B.A., Borisov, V.O., and Rakhlin, V.I., Effect of the Chemical Structure of Silyl Derivatives of Unsymmetrical Dimethylhydrazine on the Composition and Structure of Silicon Carbonitride Films: Theoretical and Experimental Studies, Inorg. Mater., 2007, vol. 43, no. 4, pp. 373–378.
3. Göbel, A., Hemberger, F., Ebert, H.-P., et al., Thermophysical Properties of an Amorphous Polymer-Derived Si/B/N/C Ceramic, Thermochim. Acta, 2011, vol. 520, pp. 20–24.
4. Sysoev, S.V., Nikulina, L.D., Kolontaeva, A.O., et al., Synthesis and Characterization of Some N-Derivatives of Hexamethyldisilazane As Precursors for the Synthesis of Si-Ge-C-N-H Films, Zh. Obshch. Khim., 2012, vol. 81, no. 12, pp. 2055–2059.
5. Rakhlin, V.I., Tsyrendorzhieva, I.P., Voronkov, M.G., et al., Characterization of Some Trimethyl(organylamino)silanes-Precursors for Preparation of Silicon Carbonitride Films, Glass Phys. Chem., 2010, vol. 36, no. 3, pp. 376–381.