Films based on phases in a Si–C–N system. Part II. plasma chemical synthesis of SiC x N y :Н films from the mixture of bis(trimethylsilyl)ethylamine and hydrogen
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Published:2017-01
Issue:1
Volume:43
Page:48-52
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ISSN:1087-6596
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Container-title:Glass Physics and Chemistry
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language:en
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Short-container-title:Glass Phys Chem
Author:
Rumyantsev Yu. M.,Yushina I. V.,Kosinova M. L.
Publisher
Pleiades Publishing Ltd
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites
Reference15 articles.
1. Hoffmann, P., Fainer, N., Kosinova, M., Baake, O., and Ensinger, W., Compilation on synthesis, characterization and properties of silicon and boron carbonitride films, in Silicon Carbide—Materials, Processing and Applications in Electronic Devices, Mukherjee, M., Ed., Rijeka, Croatia: InTech, 2011, ch. 21, pp. 487–546. 2. Ermakova, E., Mogilnikov, K., Rumyantsev, Yu., Kichay, V., Maximovskii, E., Semenova, O., and Kosinova, M., Study of Cu diffusion behavior in carbon rich SiCN: H films deposited from trimethylphenylsilane, Thin Solid Films, 2015, vol. 588, pp. 39–43. 3. Carvalho, A.T., Carvalho, R.A., Silva, M.L.P., and Demoarquette, N.R., Hydrophobic plasma polymerized hexamethyldisilazane thin films: Characterization and uses, Mater. Res., 2006, vol. 9, no. 1, pp. 9–13. 4. Chang, S.V., Tsai, H.C., Chang, J.V., Lin, S.J., and Chang, Y.S., Analysis of interface adhesion between porous SiOCH low-k film and SiCN layers by nanoindentation and nanoscratch tests, Thin Solid Films, 2008, vol. 516, pp. 5334–5338. 5. Kobayashi, K., Yokoyama, H., and Endoh, M., Leakage current and paramagnetic defects in SiCN dielectrics for copper diffusion barriers, Appl. Surf. Sci., 2008, vol. 254, pp. 6222–6225.
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