Study of chemical bonds and element composition of silicon oxycarbonitride films by the methods of XP-, IR-, and energy-dispersive spectroscopy
Author:
Publisher
Pleiades Publishing Ltd
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites
Link
http://link.springer.com/content/pdf/10.1134/S1087659617050042.pdf
Reference27 articles.
1. Fu, Y., Sun, C.Q., Du, H., and Yan, B., From diamond to crystalline silicon carbonitride: Effect of introduction of nitrogen in CH4/H2 gas mixture using MW-PECVD, Surf. Coat. Technol., 2002, vol. 160, pp. 165–172.
2. Bill, J., Seitz, J., Thurn, G., Durr, J., Canel, J., Janos, B.Z., Jalomecki, A., Santez, D., Schempp, S., Lamparter, H.P., Mayer, J., and Aldinger, F., Structure analysis and properties of Si–C–N ceramics derived from polysilazanes, Phys. Status Solidi A, 1998, vol. 166, pp. 269–296.
3. Gómez, F.J., Prieto, P., Elizalde, E., and Piquerasa, J., SiCN alloys deposited by electron cyclotron resonance plasma chemical vapor deposition, Appl. Phys. Lett., 1996, vol. 69, pp. 773–775.
4. Soto, G., Samano, E.C., Machorro, R., and Cota, L., Growth of SiC and SiCxNy films by pulsed laser ablation of SiC in Ar and N2 environments, J. Vac. Sci. Technol. A, 1998, vol. 16, pp. 1311–1315.
5. Xie, E., Ma, Z., Lin, H., and He, D., Preparation and characterization of SiCN films, Opt. Mater., 2003, vol. 23, pp. 151–156.
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