Electrical and optical properties of TiN thin films
Author:
Publisher
Pleiades Publishing Ltd
Subject
Materials Chemistry,Metals and Alloys,Inorganic Chemistry,General Chemical Engineering
Link
http://link.springer.com/content/pdf/10.1134/S0020168514010178.pdf
Reference15 articles.
1. Gagnon, G., Currie, J.F., Beique, C., et al., Characterization of reactively evaporated tin layers for diffusion barrier applications, J. Appl. Phys., 1994, vol. 75, no. 3, p. 1565.
2. Andrievskia, R.A., Dashevskyb, Z.M., and Kalinnikova, G.V., Conductivity and the Hall coefficient of nanostructured titanium nitride films, Tech. Phys. Lett., 2004, vol. 30, no. 11, p. 930.
3. Kiran, M.S.R.N., Krishna, M.G., and Padmanabhan, K.A., Growth, surface morphology, optical properties and electrical resistivity of □-TiNx (0.4 < x ≤ 0.5) films, Appl. Surf. Sci., 2008, vol. 255, p. 1934.
4. Gaoling Zhao, Tianbo Zhang, Tao Zhang, et al., Electrical and optical properties of titanium nitride coatings prepared by atmospheric pressure chemical vapor deposition, J. Non-Cryst. Solids, 2008, vol. 354, p. 1272.
5. Li-Jian Meng and Santos, M.P., Characterization of titanium nitride films prepared by d.c. reactive magnetron sputtering at different nitrogen pressures, Surf. Coat. Technol., 1997, vol. 90, p. 64.
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