Characterization of titanium nitride films prepared by d.c. reactive magnetron sputtering at different nitrogen pressures
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference24 articles.
1. TiN coatings on M2 steel produced by plasma-assisted chemical vapor deposition
2. Performance and failure mechanisms of TiN diffusion barrier layers in submicron devices
3. Reactively sputtered TiN as a diffusion barrier between Cu and Si
4. Structure and properties of TiN coatings
5. Growth and properties of single crystal TiN films deposited by reactive magnetron sputtering
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