1. Rossnagel, S.M., Cuomo, J.J., and Westwood, W.D., Handbook of Plasma Processing Technology, Park Ridge: Noyes, 1990.
2. Rooth, J.R., Industrial Plasma Engineering, Philadelphia: Inst. of Phys., 1995.
3. Roosmalen, A.J., Baggerman, J.A.G., and Brader, S.J.H., Dry Etching for VLSI, New York: Plenum, 1991.
4. Wolf, S. and Tauber, R.N., Silicon Processing for the VLSI Era, Vol. 1: Process Technology, New York: Lattice, 2000.
5. Lieberman M.A. and Lichtenberg A.J., Principles of Plasma Discharges and Materials Processing, New York: Wiley, 1994.