Energetics of silicon suboxides
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.61.9899/fulltext
Reference25 articles.
1. The electronic structure at the atomic scale of ultrathin gate oxides
2. Microscopic structure of theSiO2/Si interface
3. SiO2/Si(100) interface studied by Al Kα x‐ray and synchrotron radiation photoelectron spectroscopy
4. Core‐level photoemission and the structure of the Si/SiO2interface: A reappraisal
5. New Structural Model forSi/SiO2Interfaces Derived from Spherosiloxane Clusters: Implications for Si2pPhotoemission Spectroscopy
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