Nanoscale pattern formation on solid surfaces bombarded by two broad ion beams in the regime in which sputtering is negligible
Author:
Funder
National Science Foundation
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevE.103.022804/fulltext
Reference50 articles.
1. Self-organized nanopatterning of silicon surfaces by ion beam sputtering
2. Theory of ripple topography induced by ion bombardment
3. Formation of Ordered Nanoscale Semiconductor Dots by Ion Sputtering
4. Roughness Evolution of Ion Sputtered Rotating InP Surfaces: Pattern Formation and Scaling Laws
5. Self-Assembly of Ordered Semiconductor Nanoholes by Ion Beam Sputtering
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