Electron distribution function in a low-pressure inductively coupled plasma
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevE.52.972/fulltext
Reference22 articles.
1. Novel radio‐frequency induction plasma processing techniques
2. Two-dimensional modeling of high plasma density inductively coupled sources for materials processing
3. Fast two‐dimensional self‐consistent kinetic modeling of low‐pressure inductively coupled RF discharges
4. Nonlocal electron kinetics in a low‐pressure inductively coupled radio‐frequency discharge
5. Electron Energy Distributions in Stationary Discharges
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