Gallium, neon and helium focused ion beam milling of thin films demonstrated for polymeric materials: study of implantation artifacts-Reference-Cited by-同舟云学术

Gallium, neon and helium focused ion beam milling of thin films demonstrated for polymeric materials: study of implantation artifacts

Published:2019 Issue:3 Volume:11 Page:1403-1409
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Allen Frances I.¹²³⁴⁵^ORCID,Velez Nathan R.¹²³⁴⁵,Thayer Rachel C.⁶²³,Patel Nipam H.⁶²³⁷²,Jones Mary Ann⁸⁹¹⁰³,Meyers Gregory F.⁸⁹¹⁰³,Minor Andrew M.¹²³⁴⁵

Affiliation:

1. Department of Materials Science and Engineering

2. Berkeley

3. USA

4. National Center for Electron Microscopy

5. Molecular Foundry

6. Department of Integrative Biology

7. Department of Molecular and Cell Biology

8. Core R&D - Analytical Sciences

9. The Dow Chemical Company

10. Midland

Abstract

The focused helium ion beam is ideally suited to precision milling of thin films avoiding implantation artifacts.

Funder

National Science Foundation

U.S. Department of Energy

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2019/NR/C8NR08224C

Reference25 articles.

1. Focused Ion Beam Microscopy and Micromachining

2. Applications of focused ion beam microscopy to materials science specimens

3. Recent Developments in Nanofabrication Using Focused Ion Beams

4. Large volume serial section tomography by Xe Plasma FIB dual beam microscopy

5. Patterning, Characterization, and Chemical Sensing Applications of Graphene Nanoribbon Arrays Down to 5 nm Using Helium Ion Beam Lithography

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