Patterning, Characterization, and Chemical Sensing Applications of Graphene Nanoribbon Arrays Down to 5 nm Using Helium Ion Beam Lithography-Reference-Cited by-同舟云学术

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Patterning, Characterization, and Chemical Sensing Applications of Graphene Nanoribbon Arrays Down to 5 nm Using Helium Ion Beam Lithography

Published:2014-01-27 Issue:2 Volume:8 Page:1538-1546
ISSN:1936-0851
Container-title:ACS Nano
language:en
Short-container-title:ACS Nano

Author:

Abbas Ahmad N.¹²,Liu Gang¹,Liu Bilu¹,Zhang Luyao¹,Liu He¹,Ohlberg Douglas³,Wu Wei¹,Zhou Chongwu¹

Affiliation:

1. Department of Electrical Engineering, University of Southern California, Los Angeles, California 90089, United States

2. Department of Electrical Engineering, King Abdulaziz University, Abdullah Sulayman Street, Jeddah 22254, Saudi Arabia

3. Intelligent infrastructure Lab, HP Laboratories, Hewlett-Packard Co., Palo Alto, California 94304, United States

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/nn405759v

Reference73 articles.

1. Electric Field Effect in Atomically Thin Carbon Films

2. Thermal properties of graphene and nanostructured carbon materials

3. Superior Thermal Conductivity of Single-Layer Graphene

4. Large-scale pattern growth of graphene films for stretchable transparent electrodes

5. Measurement of the Elastic Properties and Intrinsic Strength of Monolayer Graphene

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