Resistive switching of the HfOx/HfO2 bilayer heterostructure and its transmission characteristics as a synapse
Author:
Affiliation:
1. State Key Laboratory of Solidification Processing
2. MIIT Key Laboratory of Radiation Detection Materials and Devices
3. School of Materials Science and Engineering
4. Northwestern Polytechnical University
5. Xi'an 710072
Abstract
In this work, HfOx/HfO2 homo-bilayer structure based resistive random access memory devices were fabricated, and the resistive switching characteristics of the devices were investigated.
Funder
Northwestern Polytechnical University
Publisher
Royal Society of Chemistry (RSC)
Subject
General Chemical Engineering,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2018/RA/C8RA06230G
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