Ultrasensitive non-chemically amplified low-contrast negative electron beam lithography resist with dual-tone behaviour-Reference-Cited by-同舟云学术

Ultrasensitive non-chemically amplified low-contrast negative electron beam lithography resist with dual-tone behaviour

Published:2013 Issue:7 Volume:1 Page:1392
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Canalejas-Tejero Víctor,Carrasco Sergio,Navarro-Villoslada Fernando,García Fierro José Luis,Capel-Sánchez María del Carmen,Moreno-Bondi María Cruz,Barrios Carlos Angulo

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2013/TC/C2TC00148A

Reference27 articles.

1. Nanoscience, Nanotechnology, and Chemistry

2. Nanoscience and Nanotechnology: A Personal View of a Chemist

3. Lithography and Other Patterning Techniques for Future Electronics

4. Imprint of sub‐25 nm vias and trenches in polymers

5. Ultrafast and direct imprint of nanostructures in silicon

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