Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography-Reference-Cited by-同舟云学术

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Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography

Published:2022-05-27 Issue:32 Volume:32 Page:2202710
ISSN:1616-301X
Container-title:Advanced Functional Materials
language:en
Short-container-title:Adv Funct Materials

Author:

Lewis Scott M.¹²³^ORCID,DeRose Guy A.²,Alty Hayden R.¹,Hunt Matthew S.²,Lee Nathan²,Mann James A.¹,Grindell Richard³,Wertheim Alex²,De Rose Lucia²,Fernandez Antonio¹,Muryn Christopher A.¹,Whitehead George F. S.¹,Timco Grigore A.¹,Scherer Axel²,Winpenny Richard E. P.¹³

Affiliation:

1. Department of Chemistry and Photon Science Institute The University of Manchester Oxford Road Manchester M13 9PL UK

2. The Kavli Nanoscience Institute California Institute of Technology 1200 East California Boulevard, 107 – 81 Pasadena CA 91125 USA

3. Sci‐Tron Ltd 34 High Street, Aldridge Walsall WS9 8LZ UK

Funder

Engineering and Physical Sciences Research Council

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/adfm.202202710

Reference16 articles.

1. Understanding of hydrogen silsesquioxane electron resist for sub-5-nm-half-pitch lithography

2. 50 keV electron multibeam mask writer for the 11nm HP node: first results of the proof of concept tool (eMET POC)

3. Characterisation of a novel electron beam lithography resist, SML and its comparison to PMMA and ZEP resists

4. Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art

5. Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating

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1. Novel Etch-Resistant Molecular Glass Photoresist Based on Pyrene Derivatives for Electron Beam Lithography;ACS Omega;2024-08-27

2. Heterometallic Ti-Zr oxo nanocluster photoresists for advanced lithography;Science China Materials;2024-08-06

3. Nonchemically amplified molecular resist based on multi-sulfonium modified triptycene for electron beam and extreme ultraviolet lithography;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-07-11

4. A novel non-chemically amplified resist based on polystyrene-iodonium derivatives for electron beam lithography;Nanotechnology;2024-04-30

5. Deterministic Single-Row-Droplet Catalyst Formation for Uniform Growth Integration of High-Density Silicon Nanowires;ACS Applied Materials & Interfaces;2024-04-29

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