Chemical vapor deposition of MoS2 layers from Mo–S–C–O–H system: thermodynamic modeling and validation-Reference-Cited by-同舟云学术

Chemical vapor deposition of MoS2 layers from Mo–S–C–O–H system: thermodynamic modeling and validation

Published:2016 Issue:22 Volume:18 Page:14918-14926
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Dhar Sukanya¹²³⁴,Kranthi Kumar V.¹²³⁴,Choudhury Tanushree H.¹²³⁴,Shivashankar S. A.¹²³⁴,Raghavan S.¹²³⁴

Affiliation:

1. Centre for Nano Science and Engineering

2. Indian Institute of Science

3. Bengaluru 560012

4. India

Abstract

To determine growth windows for CVD of contamination-free layered MoS₂, thermodynamic modelling and experimental validation of the Mo–S–C–O–H system are conducted.

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2016/CP/C6CP01617K

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