Wafer-scale MoS<sub>2</sub> with water-vapor assisted showerhead MOCVD-Reference-Cited by-同舟云学术

Wafer-scale MoS₂ with water-vapor assisted showerhead MOCVD

Published:2022 Issue:20 Volume:4 Page:4391-4401
ISSN:2516-0230
Container-title:Nanoscale Advances
language:en
Short-container-title:Nanoscale Adv.

Author:

Macha Michal¹,Ji Hyun Goo²,Tripathi Mukesh²,Zhao Yanfei²,Thakur Mukeshchand¹,Zhang Jing²,Kis Andras²,Radenovic Aleksandra¹^ORCID

Affiliation:

1. Laboratory of Nanoscale Biology, Institute of Bioengineering, Ecole Polytechnique Federale de Lausanne (EPFL), Lausanne, 1015, Switzerland

2. Laboratory of Nanoscale Electronics and Structures, Electrical Engineering Institute and Institute of Materials Science, Ecole Polytechnique Federale de Lausanne (EPFL), Lausanne, 1015, Switzerland

Abstract

We adapted the most efficient monolayer growth methodologies from tube-furnace systems to the showerhead geometries. A combination of gas-phase precursors, pre-seeding substrate coating and H2O vapor added during growth yields 4-inch monolayer MoS2.

Funder

Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung

Competence Centre for Materials Science and Technology

H2020 European Research Council

Publisher

Royal Society of Chemistry (RSC)

Subject

General Engineering,General Materials Science,General Chemistry,Atomic and Molecular Physics, and Optics,Bioengineering

Link

http://pubs.rsc.org/en/content/articlepdf/2022/NA/D2NA00409G

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1. 2D transition metal dichalcogenides