High-throughput morphology mapping of self-assembling ternary polymer blends-Reference-Cited by-同舟云学术

High-throughput morphology mapping of self-assembling ternary polymer blends

Published:2020 Issue:69 Volume:10 Page:42529-42541
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Toth Kristof¹²³⁴^ORCID,Osuji Chinedum O.⁵⁶⁷⁴^ORCID,Yager Kevin G.⁸⁹¹⁰⁴^ORCID,Doerk Gregory S.⁸⁹¹⁰⁴^ORCID

Affiliation:

1. Department of Chemical and Environmental Engineering

2. Yale University

3. New Haven

4. USA

5. Department of Chemical and Biomolecular Engineering

6. University of Pennsylvania

7. Philadelphia

8. Center for Functional Nanomaterials

9. Brookhaven National Laboratory

10. New York 11973

Abstract

Compositionally graded electrospray deposition combined with grazing incidence small angle X-ray scattering forms a high-throughput approach for mapping phase behavior in ternary mixtures as demonstrated here using block copolymer blends.

Funder

U.S. Department of Energy

National Science Foundation

Office of Science

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2020/RA/D0RA08491C

Reference82 articles.

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2. Enabling complex nanoscale pattern customization using directed self-assembly

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5. Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat

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