Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,General Materials Science,Biomedical Engineering,Atomic and Molecular Physics, and Optics,Bioengineering
Reference46 articles.
1. Hawker, C. J. & Russell, T. P. Block copolymer lithography: merging ‘bottom-up’ with ‘top-down’ processes. MRS Bull. 30, 952–966 (2005).
2. Ruiz, R. et al. Density multiplication and improved lithography by directed block copolymer assembly. Science 321, 936–939 (2008).
3. Bita, I. et al. Graphoepitaxy of self-assembled block copolymers on two-dimensional periodic patterned templates. Science 321, 939–943 (2008).
4. Cheng, J. Y. et al. Dense self-assembly on sparse chemical patterns: rectifying and multiplying lithographic patterns using block copolymers. Adv. Mater. 20, 3155–3158 (2008).
5. Delgadillo, P. A. R. et al. Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment. J. Micro-Nanolith. MEM. 11, 031302 (2012).
Cited by
157 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献