Dense Self-Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers
Author:
Publisher
Wiley
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
Reference25 articles.
1. Polymer self assembly in semiconductor microelectronics
2. Block copolymers and conventional lithography
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5. 2.5-inch disk patterned media prepared by an artificially assisted self-assembling method
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