Engineering Self-Assembled Domain Asymmetry in Solvent Vapor Annealed Block Copolymer–Homopolymer Blend Films
Author:
Affiliation:
1. Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States
2. National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, New York 11973, United States
Funder
Office of Science
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.macromol.3c01652
Reference65 articles.
1. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly
2. Two-Dimensional Pattern Formation Using Graphoepitaxy of PS-b-PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication
3. Enabling complex nanoscale pattern customization using directed self-assembly
4. Sub-50-nm self-assembled nanotextures for enhanced broadband antireflection in silicon solar cells
5. Self-assembled nanotextures impart broadband transparency to glass windows and solar cell encapsulants
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