Atmospheric-pressure atomic layer deposition: recent applications and new emerging applications in high-porosity/3D materials-Reference-Cited by-同舟云学术

Atmospheric-pressure atomic layer deposition: recent applications and new emerging applications in high-porosity/3D materials

Published:2023 Issue:30 Volume:52 Page:10254-10277
ISSN:1477-9226
Container-title:Dalton Transactions
language:en
Short-container-title:Dalton Trans.

Author:

Chen M.¹^ORCID,Nijboer M. P.¹^ORCID,Kovalgin A. Y.²^ORCID,Nijmeijer A.¹,Roozeboom F.¹^ORCID,Luiten-Olieman M. W. J.¹^ORCID

Affiliation:

1. Inorganic Membranes, Department of Science and Technology and MESA+ Institute for Nanotechnology, University of Twente, PO Box 217, 7500 AE Enschede, The Netherlands

2. Integrated Devices and Systems, Faculty of Electrical Engineering, Mathematics and Computer Science, MESA+ Institute for Nanotechnology, University of Twente, PO Box 217, 7500 AE Enschede, The Netherlands

Abstract

Atmospheric-pressure atomic layer deposition (ALD) is an upcoming technology poised to revolutionize the commercial production of large-area substrates and unlock new applications in high-porosity/3D materials.

Funder

Nederlandse Organisatie voor Wetenschappelijk Onderzoek

Publisher

Royal Society of Chemistry (RSC)

Subject

Inorganic Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2023/DT/D3DT01204B

Reference157 articles.

1. International Roadmap for Devices and Systems (IRDS) 2022 Edition – IEEE IRDS, (accessed on March 20, 2023)

2. A brief review of atomic layer deposition: from fundamentals to applications

3. Atomic Layer Deposition: An Overview