Directed self assembly of block copolymers using chemical patterns with sidewall guiding lines, backfilled with random copolymer brushes-Reference-Cited by-同舟云学术

Directed self assembly of block copolymers using chemical patterns with sidewall guiding lines, backfilled with random copolymer brushes

Published:2015 Issue:47 Volume:11 Page:9107-9114
ISSN:1744-683X
Container-title:Soft Matter
language:en
Short-container-title:Soft Matter

Author:

Pandav Gunja¹²³,Durand William J.¹²³,Ellison Christopher J.¹²³,Willson C. Grant¹²³¹⁴,Ganesan Venkat¹²³

Affiliation:

1. The University of Texas at Austin

2. McKetta Department of Chemical Engineering

3. Austin, USA

4. Department of Chemistry

Abstract

Directed self-assembly of block copolymers on chemical patterns with sidewall guiding lines is examined as a function of backfill brush properties, block copolymer film thickness, pattern size, and sidewall interaction strength.

Publisher

Royal Society of Chemistry (RSC)

Subject

Condensed Matter Physics,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2015/SM/C5SM01951F

Reference57 articles.

1. Directed block copolymer self-assembly for nanoelectronics fabrication

2. Block copolymers and conventional lithography

3. Directing the self-assembly of block copolymers

4. Block Copolymer Lithography

5. Rectangular Patterns Using Block Copolymer Directed Assembly for High Bit Aspect Ratio Patterned Media

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