Hybrid line–dot nanopatterns from directed self-assembly of diblock copolymers by trenches-Reference-Cited by-同舟云学术

Hybrid line–dot nanopatterns from directed self-assembly of diblock copolymers by trenches

Published:2019 Issue:19 Volume:21 Page:10011-10021
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Zhao Wenfeng¹²³⁴⁵,Duan Chao¹²³⁴⁵,Li Weihua¹²³⁴⁵^ORCID

Affiliation:

1. State Key Laboratory of Molecular Engineering of Polymers

2. Key Laboratory of Computational Physical Sciences

3. Department of Macromolecular Science

4. Fudan University

5. Shanghai 200433

Abstract

We demonstrate that the directed self-assembly of AB diblock copolymers by periodic trenches can be used to fabricate large-scale ordered hybrid line–dot nanopatterns in addition to a defect-free dot nanopattern.

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2019/CP/C9CP00949C

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