Block Copolymer Lithography
Author:
Affiliation:
1. Department of Chemistry, The University of Texas at Austin, Austin, Texas 78712, United States
2. McKetta Department of Chemical Engineering, The University of Texas at Austin, Austin, Texas 78712, United States
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ma401762n
Reference121 articles.
1. Advances in Patterning Materials for 193 nm Immersion Lithography
2. Cost-Effective Sub-20 nm Lithography: Smart Chemicals to the Rescue
3. Block Copolymer Thermodynamics: Theory and Experiment
4. Block Copolymer Based Nanostructures: Materials, Processes, and Applications to Electronics
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