Low-temperature fabrication of high performance indium oxide thin film transistors
Author:
Affiliation:
1. College of Physics and Lab of New Fiber Materials and Modern Textile
2. Growing Base for State Key Laboratory
3. Qingdao University
4. Qingdao 266071
5. China
6. Electronic Ceramics Center
7. DongEui University
8. Busan 614-714
9. South Korea
Abstract
In this study, indium oxide (In2O3) thin-film transistors (TFTs) were fabricated by a fully-solution process at low temperature.
Funder
National Natural Science Foundation of China
Publisher
Royal Society of Chemistry (RSC)
Subject
General Chemical Engineering,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2015/RA/C5RA04145G
Reference42 articles.
1. Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors
2. High-mobility thin-film transistor with amorphous InGaZnO4 channel fabricated by room temperature rf-magnetron sputtering
3. A General Route to Printable High-Mobility Transparent Amorphous Oxide Semiconductors
4. Recent Advances in Organic Transistor Printing Processes
5. Mussel-Inspired Surface Chemistry for Multifunctional Coatings
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