Influences of oxygen source and substrate temperature on the unusual growth mechanism of atomic layer deposited magnesium oxide using bis(cyclopentadienyl)magnesium precursor-Reference-Cited by-同舟云学术

Influences of oxygen source and substrate temperature on the unusual growth mechanism of atomic layer deposited magnesium oxide using bis(cyclopentadienyl)magnesium precursor

Published:2021 Issue:42 Volume:9 Page:15359-15374
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Wang Bo Wen¹²^ORCID,Choi Jinwoo¹²,Kim Hyoung Gyun¹,Hyun Seung Dam¹²,Yoo Chanyoung¹²^ORCID,Kim Seungsoo¹²^ORCID,Lee Hoin¹²,Hwang Cheol Seong¹²^ORCID

Affiliation:

1. Department of Materials Science and Engineering, Seoul National University, Seoul 08826, Republic of Korea

2. Inter-University Semiconductor Research Center, Seoul National University, Seoul 08826, Republic of Korea

Abstract

This work reveals the unusual MgO ALD growth behaviours as a function of sequence time and substrate temperature, with H2O and O3 as oxygen source, respectively.

Funder

National Research Foundation of Korea

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2021/TC/D1TC04223H

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