Metal-carbonyl organometallic polymers, PFpP, as resists for high-resolution positive and negative electron beam lithography-Reference-Cited by-同舟云学术

Metal-carbonyl organometallic polymers, PFpP, as resists for high-resolution positive and negative electron beam lithography

Published:2015 Issue:99 Volume:51 Page:17592-17595
ISSN:1359-7345
Container-title:Chemical Communications
language:en
Short-container-title:Chem. Commun.

Author:

Zhang J.¹²³⁴⁵,Cao K.⁶²³⁴⁵,Wang X. S.⁶²³⁴⁵,Cui B.¹²³⁴⁵

Affiliation:

1. Department of Electrical and Computer Engineering

2. Waterloo Institute for Nanotechnology (WIN)

3. University of Waterloo

4. Waterloo

5. Canada

6. Department of Chemistry

Abstract

Metal-carbonyl organometallic polymers, PFpP, can function as high-resolution resists for electron beam lithography.

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,General Chemistry,Ceramics and Composites,Electronic, Optical and Magnetic Materials,Catalysis

Link

http://pubs.rsc.org/en/content/articlepdf/2015/CC/C5CC07117H

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3. Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art

4. High molecular weight polystyrene as very sensitive electron beam resist

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