Microwave-assisted vapor phase dissolution of photoresist and silicon oxide based slurry samples for the determination of trace impurities by high resolution ICP-MS-Reference-Cited by-同舟云学术

Microwave-assisted vapor phase dissolution of photoresist and silicon oxide based slurry samples for the determination of trace impurities by high resolution ICP-MS

Published:2005 Issue:11 Volume:20 Page:1290
ISSN:0267-9477
Container-title:Journal of Analytical Atomic Spectrometry
language:en
Short-container-title:J. Anal. At. Spectrom.

Author:

Wan Chia-Ching,Jiang Shiuh-Jen,You Min-Ta,Sahayam A. C.

Publisher

Royal Society of Chemistry (RSC)

Subject

Spectroscopy,Analytical Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2005/JA/B507640D

Reference15 articles.

1. Characterization and Modeling of Out‐Diffusion of Manganese and Zinc Impurities from Deep Ultraviolet Photoresist

2. Evaluation of Metal Migration and Determination of Trace Metals after Microwave Digestion for Lithographic Materials

3. Application of inductively coupled plasma mass spectrometry for total metal determination in silicon-containing solid samples using the microwave-assisted nitric acid–hydrofluoric acid–hydrogen peroxide–boric acid digestion system

4. Microwave digestion of plant and grain standard reference materials in nitric and hydrofluoric acids for multi-elemental determination by inductively coupled plasma mass spectrometry

5. Evaluation of a microwave-oven system for the dissolution of geologic samples

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