Solubility studies of inorganic–organic hybrid nanoparticle photoresists with different surface functional groups-Reference-Cited by-同舟云学术

Solubility studies of inorganic–organic hybrid nanoparticle photoresists with different surface functional groups

Published:2016 Issue:3 Volume:8 Page:1338-1343
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Li Li¹²³,Chakrabarty Souvik¹²³,Jiang Jing¹²³,Zhang Ben¹²³,Ober Christopher¹²³,Giannelis Emmanuel P.¹²³

Affiliation:

1. Department of Materials Science and Engineering

2. Cornell University

3. Ithaca, USA

Abstract

The solubility behavior of Hf and Zr based hybrid nanoparticles with different surface ligands in different concentrations of photoacid generator as potential EUV photoresists was investigated in detail.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2016/NR/C5NR07334K

Reference36 articles.

1. Resist Materials and Processes for Extreme Ultraviolet Lithography

2. Extreme ultraviolet lithography: A review

3. Lithography gets extreme

4. Nanoparticle photoresists from HfO2 and ZrO2 for EUV patterning

5. High refractive index and high transparency HfO2 nanocomposites for next generation lithography

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