Metallic filamentary conduction in valence change-based resistive switching devices: the case of TaOx thin film with x ∼ 1

Author:

Rosário Carlos M. M.12345ORCID,Thöner Bo6789,Schönhals Alexander5789,Menzel Stephan1011129ORCID,Meledin Alexander13714915ORCID,Barradas Nuno P.161718194ORCID,Alves Eduardo201718194ORCID,Mayer Joachim13714915ORCID,Wuttig Matthias678910ORCID,Waser Rainer578910ORCID,Sobolev Nikolai A.123421ORCID,Wouters Dirk J.5789

Affiliation:

1. Physics Department and I3N

2. University of Aveiro

3. Aveiro

4. Portugal

5. Institut für Werkstoffe der Elektrotechnik II

6. I. Physikalisches Institut IA

7. RWTH Aachen University

8. Aachen

9. Germany

10. Peter Grünberg Institute and JARA-FIT

11. Forschungszentrum Jülich GmbH

12. Jülich

13. Central Facility for Electron Microscopy

14. 52074 Aachen

15. Ernst Ruska-Centre for Microscopy and Spectroscopy with Electrons (ER-C)

16. Centro de Ciências e Tecnologias Nucleares

17. Instituto Superior Técnico

18. Universidade de Lisboa

19. Bobadela

20. Instituto de Plasmas e Fusão Nuclear and Laboratório de Aceleradores e Tecnologias de Radiação

21. National University of Science and Technology MISiS

Abstract

A detailed study of the electrical transport in TaOx thin films with x ∼ 1 provides an insight into the conduction in conductive filaments inside Ta2O5-based resistive switching devices.

Funder

Fundação para a Ciência e a Tecnologia

Deutsche Forschungsgemeinschaft

Ministry of Education and Science of the Russian Federation

Deutscher Akademischer Austauschdienst

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

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