Direct-liquid-evaporation chemical vapor deposition of smooth, highly conformal cobalt and cobalt nitride thin films-Reference-Cited by-同舟云学术

Direct-liquid-evaporation chemical vapor deposition of smooth, highly conformal cobalt and cobalt nitride thin films

Published:2015 Issue:46 Volume:3 Page:12098-12106
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Yang Jing¹²³⁴⁵,Li Kecheng¹²³⁴⁵,Feng Jun⁶³⁴⁵,Gordon Roy G.¹²³⁴⁵

Affiliation:

1. School of Engineering

2. Applied Sciences

3. Harvard University

4. Cambridge

5. USA

6. Department of Chemistry and Chemical Biology

Abstract

By a direct-liquid-evaporation chemical vapor deposition (DLE-CVD) method, we deposited smooth low-resistance cobalt (Co) and cobalt nitride (Co_xN) thin films with excellent conformality at low temperatures down to 200 °C.

Funder

National Science Foundation

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2015/TC/C5TC03221K

Reference42 articles.

1. Oscillations in exchange coupling and magnetoresistance in metallic superlattice structures: Co/Ru, Co/Cr, and Fe/Cr

2. Giant magnetoresistance in heterogeneous Cu-Co alloys

3. Spin-Dependent Tunneling in Self-Assembled Cobalt-Nanocrystal Superlattices

4. Electrical control of the ferromagnetic phase transition in cobalt at room temperature

5. Atomic layer deposition of transition metals

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