Pulsed chemical vapor deposition of cobalt and cobalt carbide thin films-Reference-Cited by-同舟云学术

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Pulsed chemical vapor deposition of cobalt and cobalt carbide thin films

Published:2022-03 Issue:2 Volume:40 Page:023401
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Chen Sen¹,Zhang Xiangyu¹,Liu Bowen¹,Liu Zhongwei¹

Affiliation:

1. Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, China

Funder

National Natural Science Foundation of China

Beijing Municipal Bureau of Finance

Beijing Institute of Graphic Communication

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://avs.scitation.org/doi/pdf/10.1116/6.0001578

Reference45 articles.

1. Modulation of magnetic and structural properties of cobalt thin films by means of electrodeposition

2. Cobalt-based anisotropic particles prepared by the polyol process

3. Atomic layer deposition of transition metals for silicide contact formation: Growth characteristics and silicidation

4. Atomic Interdiffusion and Diffusive Stabilization of Cobalt by Copper During Atomic Layer Deposition from Bis(N-tert-butyl-N′-ethylpropionamidinato) Cobalt(II)

5. Cobalt(I) Olefin Complexes: Precursors for Metal–Organic Chemical Vapor Deposition of High Purity Cobalt Metal Thin Films

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