Ultrasonic atomization of titanium isopropoxide at room temperature for TiO2 atomic layer deposition-Reference-Cited by-同舟云学术

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Ultrasonic atomization of titanium isopropoxide at room temperature for TiO2 atomic layer deposition

Published:2020-12 Issue:6 Volume:38 Page:062405
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Jang Moon-Hyung¹,Lei Yu¹^ORCID

Affiliation:

1. Department of Chemical and Materials Engineering, University of Alabama in Huntsville, Huntsville, Alabama 35899

Funder

National Aeronautics and Space Administration

U.S. Department of Defense

Division of Chemical, Bioengineering, Environmental, and Transport Systems

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/am-pdf/10.1116/6.0000464

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Structural, optical, and electrical properties of TiO2 thin films deposited by ALD: Impact of the substrate, the deposited thickness and the deposition temperature;Applied Surface Science;2023-01

2. Recent Advances in Materials Design Using Atomic Layer Deposition for Energy Applications;Advanced Functional Materials;2021-12-06

3. Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance;Journal of Physics D: Applied Physics;2021-11-16

4. Tuning the band gap and carrier concentration of titania films grown by spatial atomic layer deposition: a precursor comparison;Nanoscale Advances;2021

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