Structural, optical, and electrical properties of TiO2 thin films deposited by ALD: Impact of the substrate, the deposited thickness and the deposition temperature-Reference-Cited by-同舟云学术

Structural, optical, and electrical properties of TiO2 thin films deposited by ALD: Impact of the substrate, the deposited thickness and the deposition temperature

Published:2023-01 Issue: Volume:608 Page:155214
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Jolivet Aline,Labbé Christophe,Frilay Cédric,Debieu Olivier,Marie Philippe,Horcholle Bryan,Lemarié Franck,Portier Xavier,Grygiel Clara,Duprey Sylvain,Jadwisienczak Wojciech,Ingram David,Upadhyay Mudit,David Adrian,Fouchet Arnaud,Lüders Ulrike,Cardin Julien

Funder

ANR

Région Normandie

Centre National de la Recherche Scientifique

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference90 articles.

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2. Electronic and optical properties of three phases of titanium dioxide: Rutile, anatase, and brookite;Mo;Phys. Rev. B.,1995

3. Brookite, the Least Known TiO2 Photocatalyst;Di Paola;Catalysts.,2013