Titanium isopropoxide as a precursor in atomic layer epitaxy of titanium dioxide thin films-Reference-Cited by-同舟云学术

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Titanium isopropoxide as a precursor in atomic layer epitaxy of titanium dioxide thin films

Published:1993-08-01 Issue:8 Volume:5 Page:1174-1181
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Ritala Mikko,Leskela Markku,Niinisto Lauri,Haussalo Pekka

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm00032a023

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