A self-assembled graphene nanomask for the epitaxial growth of nonplanar and planar GaN-Reference-Cited by-同舟云学术

A self-assembled graphene nanomask for the epitaxial growth of nonplanar and planar GaN

Published:2019 Issue:40 Volume:21 Page:6109-6117
ISSN:1466-8033
Container-title:CrystEngComm
language:en
Short-container-title:CrystEngComm

Author:

Xu Yu¹²³⁴⁵^ORCID,Cao Bing⁶⁷⁸⁴⁹,Li Zongyao⁵³⁴,Zheng Shunan¹²³⁴,Cai Demin⁵³⁴,Wang Mingyue¹²³⁴⁵,Zhang Yumin¹²³⁴⁵,Wang Jianfeng¹²³⁴⁵,Wang Chinhua⁶⁷⁸⁴⁹,Xu Ke¹²³⁴⁵

Affiliation:

1. Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO)

2. Chinese Academy of Sciences (CAS)

3. Suzhou 215123

4. People's Republic of China

5. Suzhou Nanowin Science and Technology Co., Ltd.

6. School of Optoelectronic Science and Engineering & Collaborative Innovation Center of Suzhou Nano Science and Technology

7. Soochow University

8. Suzhou 215006

9. Key Lab of Advanced Optical Manufacturing Technologies of Jiangsu Province & Key Lab of Modern Optical Technologies of Education Ministry of China

Abstract

Herein, we demonstrated the fabrication of architectural GaN nanostructures by the self-assembly NSAG (SNSAG) technology using multilayer graphene (MLG) as a nanomask.

Funder

National Natural Science Foundation of China

National Basic Research Program of China

National Key Scientific Instrument and Equipment Development Projects of China

Publisher

Royal Society of Chemistry (RSC)

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2019/CE/C9CE00970A

Reference49 articles.

1. Recent developments and future directions in the growth of nanostructures by van der Waals epitaxy