Low-toxicity chemical solution deposition of ferroelectric Ca:HfO2

Author:

Badillo Miguel12ORCID,Taleb Sepide1ORCID,Mokabber Taraneh1ORCID,Rieck Jan2,Castanedo Rebeca3ORCID,Torres Gerardo3ORCID,Noheda Beatriz2ORCID,Acuautla Mónica1ORCID

Affiliation:

1. Engineering and Technology Institute Groningen (ENTEG), Faculty of Science and Engineering, University of Groningen, Nijenborgh 4, Groningen 9747AG, The Netherlands

2. Zernike Institute for Advanced Materials (ZIAM), Faculty of Science and Engineering, University of Groningen, Nijenborgh 4, Groningen 9747AG, The Netherlands

3. Centro de Investigación y de Estudios Avanzados del I.P.N. (CINVESTAV), Unidad Querétaro, 76230, Querétaro, Mexico

Abstract

Simple, stable, and low-toxicity chemical solution for deposition of ferroelectric Ca:HfO2 films.

Funder

Consejo Nacional de Ciencia y Tecnología

Rijksuniversiteit Groningen

H2020 Marie Skłodowska-Curie Actions

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Reference67 articles.

1. Ferroelectricity in hafnium oxide thin films

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3. T.Francois , C.Pellissier , S.Slesazeck , V.Havel , C.Richter , A.Makosiej , B.Giraud , E. T.Breyer , M.Materano , P.Chiquet , M.Bocquet , L.Grenouillet , E.Nowak , U.Schroeder , F.Gaillard , J.Coignus , P.Blaise , C.Carabasse , N.Vaxelaire , T.Magis , F.Aussenac and V.Loup , Demonstration of BEOL-compatible ferroelectric Hf0.5Zr0.5O2 scaled FeRAM co-integrated with 130nm CMOS for embedded NVM applications , IEEE , San Francisco , 2019

4. Toward Thick Piezoelectric HfO 2 ‐Based Films

5. A low-power nanoelectromechanical (NEM) device with Al-doped HfO2-based ferroelectric capacitor

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