An innovative GC-MS, NMR and ESR combined, gas-phase investigation during chemical vapor deposition of silicon oxynitrides films from tris(dimethylsilyl)amine

Author:

Decosterd Laura12345,Topka Konstantina Christina12367,Diallo Babacar3891011,Samelor Diane12367,Vergnes Hugues122367,Senocq François12367,Caussat Brigitte122367,Vahlas Constantin12367,Menu Marie-Joëlle12345ORCID

Affiliation:

1. CIRIMAT

2. Université de Toulouse

3. CNRS

4. Université Toulouse 3 – Paul Sabatier

5. 31062 Toulouse Cedex 9

6. INP-ENSIACET

7. 31030 Toulouse Cedex 4

8. Conditions Extrêmes et Matériaux

9. Haute Température et Irradiation (CEMHTI) UPR 3079

10. Université d’Orléans

11. 45071 Orléans Cedex 2

12. LGC

Abstract

Coupled analysis by GC-MS, ESR, NMR during CVD of SiOxNy implemented for the first time, highlighting reaction pathways. Silanamine precursor serves as dual source of Si and N, producing silylated radicals and at least fifteen gaseous by-products.

Funder

Agence Nationale de la Recherche

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

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