An innovative GC-MS, NMR and ESR combined, gas-phase investigation during chemical vapor deposition of silicon oxynitrides films from tris(dimethylsilyl)amine-Reference-Cited by-同舟云学术

An innovative GC-MS, NMR and ESR combined, gas-phase investigation during chemical vapor deposition of silicon oxynitrides films from tris(dimethylsilyl)amine

Published:2021 Issue:17 Volume:23 Page:10560-10572
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Decosterd Laura¹²³⁴⁵,Topka Konstantina Christina¹²³⁶⁷,Diallo Babacar³⁸⁹¹⁰¹¹,Samelor Diane¹²³⁶⁷,Vergnes Hugues¹²²³⁶⁷,Senocq François¹²³⁶⁷,Caussat Brigitte¹²²³⁶⁷,Vahlas Constantin¹²³⁶⁷,Menu Marie-Joëlle¹²³⁴⁵^ORCID

Affiliation:

1. CIRIMAT

2. Université de Toulouse

3. CNRS

4. Université Toulouse 3 – Paul Sabatier

5. 31062 Toulouse Cedex 9

6. INP-ENSIACET

7. 31030 Toulouse Cedex 4

8. Conditions Extrêmes et Matériaux

9. Haute Température et Irradiation (CEMHTI) UPR 3079

10. Université d’Orléans

11. 45071 Orléans Cedex 2

12. LGC

Abstract

Coupled analysis by GC-MS, ESR, NMR during CVD of SiO_xN_y implemented for the first time, highlighting reaction pathways. Silanamine precursor serves as dual source of Si and N, producing silylated radicals and at least fifteen gaseous by-products.

Funder

Agence Nationale de la Recherche

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2021/CP/D1CP01129D

Reference46 articles.

1. A Review: Preparation, Performance, and Applications of Silicon Oxynitride Film

2. Improving the oxygen barrier properties of PET polymer by radio frequency plasma-polymerized SiOxNy thin film

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5. Electrical evaluation of crack generation in SiN and SiO N thin-film encapsulation layers for OLED displays

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