An innovative kinetic model allowing insight in the moderate temperature chemical vapor deposition of silicon oxynitride films from tris(dimethylsilyl)amine-Reference-Cited by-同舟云学术

An innovative kinetic model allowing insight in the moderate temperature chemical vapor deposition of silicon oxynitride films from tris(dimethylsilyl)amine

Published:2022-03 Issue: Volume:431 Page:133350
ISSN:1385-8947
Container-title:Chemical Engineering Journal
language:en
Short-container-title:Chemical Engineering Journal

Author:

Topka Konstantina Christina,Vergnes Hugues^ORCID,Tsiros Tryfon,Papavasileiou Paris^ORCID,Decosterd Laura,Diallo Babacar,Senocq François,Samelor Diane,Pellerin Nadia^ORCID,Menu Marie-Joëlle^ORCID,Vahlas Constantin,Caussat Brigitte^ORCID

Funder

Agence Nationale de la Recherche

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,General Chemical Engineering,Environmental Chemistry,General Chemistry

Reference44 articles.

1. Improving the oxygen barrier properties of PET polymer by radio frequency plasma-polymerized SiOxNy thin film;Shahpanah;Surf. Coat. Technol.,2019

2. Hydrophobic, transparent and hard silicon oxynitride coating from perhydropolysilazane;Zhang;Polym. Int.,2015

3. Y. Shima, H. Hasuyama, T. Kondoh, Y. Imaoka, T. Watari, K. Baba, R. Hatada, Mechanical properties of silicon oxynitride thin films prepared by low energy ion beam assisted deposition, Nucl. Instrum. Methods Phys. Res., Sect. B 148(1-4) (1999) 599-603. https://doi.org/10.1016/S0168-583X(98)00811-8.

4. Electrical evaluation of crack generation in SiNx and SiOxNy thin-film encapsulation layers for OLED displays;Park;Appl. Surf. Sci.,2016

5. Multi-characterization study of interface passivation quality of amorphous sub-stoichiometric silicon oxide and silicon oxynitride layers for photovoltaic applications;Steffens;Sol. Energy Mater. Sol. Cells,2018

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Integrating supervised and unsupervised learning approaches to unveil critical process inputs;Computers & Chemical Engineering;2025-01

2. Comparative analysis of structural characteristics and thermal insulation properties of ZrO2 thin films deposited via chemical and physical vapor phase processes;Thin Solid Films;2024-09

3. Computational thermodynamic study on CVD of silicon oxynitride films from Si–O–N–H and Si–O–N–H–Cl systems;Ceramics International;2024-04

4. Silicon Oxynitride Coatings Are Very Promising for Inert and Durable Pharmaceutical Glass Vials;ACS Applied Engineering Materials;2023-11-24

5. Equation-based and data-driven modeling strategies for industrial coating processes;Computers in Industry;2023-08