Electrical evaluation of crack generation in SiN and SiO N thin-film encapsulation layers for OLED displays-Reference-Cited by-同舟云学术

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Electrical evaluation of crack generation in SiN and SiO N thin-film encapsulation layers for OLED displays

Published:2016-05 Issue: Volume:370 Page:126-130
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Park Eun Kil,Kim Sungmin,Heo Jaeyeong,Kim Hyeong Joon

Funder

Samsung Display Co

Nano·Material Technology Development Program through the National Research Foundation of Korea

Ministry of Science

Basic Science Research Program through the National Research Foundation of Korea

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference20 articles.

1. Direct observation of structural changes in organic light emitting devices during degradation;Kolosov;J. Appl. Phys.,2001

2. Thin-film permeation-barrier technology for flexible organic light-emitting devices;Lewis;IEEE J. Sel. Top. Quantum Electron.,2004

3. Thin film encapsulation for flexible AM-OLED: a review;Park;Semicond. Sci. Technol.,2011

4. Permeation rate measurements by electrical analysis of calcium corrosion;Paetzold;Rev. Sci. Instrum.,2003

5. Ca test of Al2O3 gas diffusion barriers grown by atomic layer deposition on polymers;Carcia;Appl. Phys. Lett.,2006

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