Enhancement of electrical performance of atomic layer deposited SnO films via substrate surface engineering

Author:

Baek In-Hwan12,Cho Ah-Jin1,Lee Ga Yeon3,Choi Heenang3,Won Sung Ok4,Eom Taeyong3,Chung Taek-Mo3ORCID,Hwang Cheol Seong2ORCID,Kim Seong Keun15ORCID

Affiliation:

1. Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul, 02792, South Korea

2. Department of Materials Science and Engineering and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, South Korea

3. Division of Advanced Materials, Korea Research Institute of Chemical Technology, Daejeon, 34114, South Korea

4. Advanced Analysis Center, Korea Institute of Science and Technology, Seoul, 02792, South Korea

5. KU-KIST Graduate School of Converging Science and Technology, Korea University, Seoul, 02841, South Korea

Abstract

Substrate surface engineering improves structural and electrical properties of ALD-grown SnO films.

Funder

Korea Institute of Science and Technology

National Research Foundation of Korea

KU-KIST Graduate School of Converging Science and Technology

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

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