Enhancement of electrical performance of atomic layer deposited SnO films via substrate surface engineering-Reference-Cited by-同舟云学术

Enhancement of electrical performance of atomic layer deposited SnO films via substrate surface engineering

Published:2021 Issue:36 Volume:9 Page:12314-12321
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Baek In-Hwan¹²,Cho Ah-Jin¹,Lee Ga Yeon³,Choi Heenang³,Won Sung Ok⁴,Eom Taeyong³,Chung Taek-Mo³^ORCID,Hwang Cheol Seong²^ORCID,Kim Seong Keun¹⁵^ORCID

Affiliation:

1. Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul, 02792, South Korea

2. Department of Materials Science and Engineering and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, South Korea

3. Division of Advanced Materials, Korea Research Institute of Chemical Technology, Daejeon, 34114, South Korea

4. Advanced Analysis Center, Korea Institute of Science and Technology, Seoul, 02792, South Korea

5. KU-KIST Graduate School of Converging Science and Technology, Korea University, Seoul, 02841, South Korea

Abstract

Substrate surface engineering improves structural and electrical properties of ALD-grown SnO films.

Funder

Korea Institute of Science and Technology

National Research Foundation of Korea

KU-KIST Graduate School of Converging Science and Technology

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2021/TC/D1TC02703D

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