Via Filling Electrodeposition by Using Periodic Reverse Pulse Current

Author:

KONDO Kazuo,NAKAMURA Taichi,MIKAMI Daisuke,OKUBO Toshikazu

Publisher

The Surface Finishing Society of Japan

Subject

General Engineering

Reference9 articles.

1. 1) JEITA:2005年度版日本実装技術ロードマップ, (電子情報技術産業協会, 2005).

2. 2) K. Kondo, N. Yamakawa, Z. Tanaka and K. Hayashi ; Analytical Electrochemistry, 599, 137 (2002).

3. Role of Additives for Copper Damascene Electrodeposition

4. High-Aspect-Ratio Copper Via Filling Used for Three-Dimensional Chip Stacking

5. 5) 近藤和夫:初歩から学ぶ微小めっき技術 (工業調査会, 2004)(K Books Series 185).

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Types of Pulse Platings and Their Utilization;Journal of The Surface Finishing Society of Japan;2017-05-01

2. Effect of Pulse Parameters on the Crystal Orientation and Etching Rate of Copper Films;Journal of The Surface Finishing Society of Japan;2013

3. High-Performance Liquid Chromatography Analysis of Copper Electroplating Additives used for Via-Filling;Journal of The Surface Finishing Society of Japan;2011

4. Electrochemical Analysis of Additives in Copper Electroplating Bath Using Diamond Electrode;Journal of the Surface Finishing Society of Japan;2010

5. Electrodeposition of Filled Via Using Periodical Reverse Current;Journal of The Surface Finishing Society of Japan;2008

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