P-Channel InGaN/GaN heterostructure metal-oxide-semiconductor field effect transistor based on polarization-induced two-dimensional hole gas
Author:
Publisher
Springer Science and Business Media LLC
Subject
Multidisciplinary
Link
http://www.nature.com/articles/srep23683.pdf
Reference36 articles.
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3. Li, G., Wang, R., Verma, J., (Grace) Xing, H. & Jena, D. Ultra-thin body GaN-on-insulator nFETs and pFETs: Towards III-nitride complementary logic. Device Research Conference (DRC): 2012 70th Annual, University Park, TX. USA: IEEE. (2012, June 18–20).
4. Del Alamo, J. A. Nanometre-scale electronics with III-V compound semiconductors. Nature 479, 317–323 (2011).
5. Wang, B. et al. An efficient high-frequency drive circuit for GaN power HFETs. IEEE Trans. Ind. Appl. 45, 843–854 (2009).
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