Development of chemically amplified reaction development patterning
Author:
Publisher
Springer Science and Business Media LLC
Subject
Materials Chemistry,Polymers and Plastics
Link
http://www.nature.com/articles/pj2009308.pdf
Reference18 articles.
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3. Dammel, R. Diazonaphthoquinone-Based Resists (The International Society for Optical Engineering, Washington, 1993).
4. Fukukawa, K. & Ueda, M. Recent progress of photosensitive polyimides. Polym. J. 40, 281–296 (2008).
5. Fukushima, T., Hosokawa, K., Oyama, T., Iijima, T., Tomoi, M. & Itatani, H. Synthesis and positive-imaging photosensitivity of soluble polyimides having pendant carboxyl groups. J. Polym. Sci. Part A: Polym. Chem. 39, 934–946 (2001).
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