Formation of Fine Pattern by Reaction Development Patterning Using Photo-Base Generator and Acidic Developers-Reference-Cited by-同舟云学术

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Formation of Fine Pattern by Reaction Development Patterning Using Photo-Base Generator and Acidic Developers

Published:2018-06-25 Issue:5 Volume:31 Page:613-616
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Tokoro Yuichiro¹,Hayashi Hiromi¹,Oyama Toshiyuki¹

Affiliation:

1. Department of Advanced Materials Chemistry, Faculty of Engineering, Yokohama National University

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/31/5/31_613/_pdf

Reference22 articles.

1. 1. T. Ogura, T. Higashihara, and M. Ueda, J. Polym. Sci. Part A: Polym. Chem., 48 (2010) 1317.

2. 2. Y. Li, X. Zhang, Q. Zhang, X. Wang, D. Cao, Z. Shi, D. Yan, and Z. Cui, RSC Adv., 6 (2016) 5377.

3. 3. X. Fei, Y. Shi, and Y. Cao, Appl. Phys. A, 100 (2010) 409.

4. 4. K.-i. Furukawa and M. Ueda, Polym. J., 40 (2008) 281.

5. 5. C. Decker, Prog. Polym. Sci., 21 (1996) 593.

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