Photosensitive engineering plastics based on reaction development patterning
Author:
Publisher
Springer Science and Business Media LLC
Subject
Materials Chemistry,Polymers and Plastics
Link
http://www.nature.com/articles/s41428-018-0028-8.pdf
Reference64 articles.
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3. Higashihara T, Saito Y, Mizoguchi K, Ueda M. Recent Progress in Negative-Working Photosensitive and Thermally Stable Polymers. React Funct Polym. 2013;73:303–15.
4. Higashihara T, Shibasaki Y, Ueda M. Development of Thermally Stable and Photosensitive Polymers. J Photopolym Sci Technol. 2012;25:9–16.
5. Kudo H, Nishikubo T. Development of Novel Photo-Functional Materials Based on Cyclic Oligomers. Polym J. 2009;41:569–81.
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