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Formation of Fine Pattern from Polyarylate-Silicone Copolymer by the Application of Reaction Development Patterning

  • Published:2017 Issue:2 Volume:30 Page:177-180
  • ISSN:0914-9244
  • Container-title:Journal of Photopolymer Science and Technology
  • language:en
  • Short-container-title:J. Photopol. Sci. Technol.

Author:

Tokoro Yuichiro1,Miyoshi Mariko1,Oyama Toshiyuki1

Affiliation:

1. Department of Advanced Materials Chemistry, Faculty of Engineering, Yokohama National University

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Reference15 articles.

1. 1. T. Ogura, T. Higashihara, and M. Ueda, J. Polym. Sci. Part A: Polym. Chem., 48 (2010) 1317.

2. 2. Y. Li, X. Zhang, Q. Zhang, X. Wang, D. Cao, Z. Shi, D. Yan, and Z. Cui, RSC Adv., 6 (2016) 5377.

3. 3. X. Fei, Y. Shi, and Y. Cao, Appl. Phys. A, 100 (2010) 409.

4. 4. K.-i. Furukawa and M. Ueda, Polym. J., 40 (2008) 281.

5. 5. T. Fukushima, T. Oyama, T. Iijima, M. Tomoi, and H. Itatani, J. Polym. Sci. Part A: Polym. Chem., 39 (2001) 3451.

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