Author:
Tanaka Atsushi,Sugiura Ryuji,Kawaguchi Daisuke,Yui Toshiki,Wani Yotaro,Aratani Tomomi,Watanabe Hirotaka,Sena Hadi,Honda Yoshio,Igasaki Yasunori,Amano Hiroshi
Abstract
AbstractWe have investigated the possibility of applying lasers to slice GaN substrates. Using a sub-nanosecond laser with a wavelength of 532 nm, we succeeded in slicing GaN substrates. In the laser slicing method used in this study, there was almost no kerf loss, and the thickness of the layer damaged by laser slicing was about 40 µm. We demonstrated that a standard high quality homoepitaxial layer can be grown on the sliced surface after removing the damaged layer by polishing.
Publisher
Springer Science and Business Media LLC
Cited by
11 articles.
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